JPS6086545A - マスク保護膜 - Google Patents

マスク保護膜

Info

Publication number
JPS6086545A
JPS6086545A JP58194579A JP19457983A JPS6086545A JP S6086545 A JPS6086545 A JP S6086545A JP 58194579 A JP58194579 A JP 58194579A JP 19457983 A JP19457983 A JP 19457983A JP S6086545 A JPS6086545 A JP S6086545A
Authority
JP
Japan
Prior art keywords
protective film
mask
mask protective
pattern
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58194579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS633302B2 (en]
Inventor
Setsuo Nagashima
長島　節夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58194579A priority Critical patent/JPS6086545A/ja
Publication of JPS6086545A publication Critical patent/JPS6086545A/ja
Publication of JPS633302B2 publication Critical patent/JPS633302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58194579A 1983-10-17 1983-10-17 マスク保護膜 Granted JPS6086545A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58194579A JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58194579A JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Publications (2)

Publication Number Publication Date
JPS6086545A true JPS6086545A (ja) 1985-05-16
JPS633302B2 JPS633302B2 (en]) 1988-01-22

Family

ID=16326886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58194579A Granted JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Country Status (1)

Country Link
JP (1) JPS6086545A (en])

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139547A (ja) * 1985-12-13 1987-06-23 Daicel Chem Ind Ltd 帯電防止性を有する感光積層体
JPS6446738A (en) * 1987-08-17 1989-02-21 Fuaintetsuku Kenkyusho Kk Antistatic photosensitive laminated film
JPH01173040A (ja) * 1987-12-28 1989-07-07 Dainippon Printing Co Ltd 製版用ガラスパターン
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
US5178976A (en) * 1990-09-10 1993-01-12 General Electric Company Technique for preparing a photo-mask for imaging three-dimensional objects
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
GB2301050A (en) * 1995-05-12 1996-11-27 Kimoto Company Limited Antistatic masking film
JP2001056544A (ja) * 1999-08-18 2001-02-27 Dainippon Printing Co Ltd ハーフトーン位相シフトフォトマスク及びそのためのハーフトーン位相シフトフォトマスク用ブランクス並びにこれを用いたパターン形成方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421303U (en]) * 1990-06-14 1992-02-24
EP3518254B1 (en) 2016-09-20 2023-02-15 Furukawa Electric Co. Ltd. Flat cable, flat cable production method, and rotating connector device equipped with flat cable

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139547A (ja) * 1985-12-13 1987-06-23 Daicel Chem Ind Ltd 帯電防止性を有する感光積層体
JPS6446738A (en) * 1987-08-17 1989-02-21 Fuaintetsuku Kenkyusho Kk Antistatic photosensitive laminated film
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
JPH01173040A (ja) * 1987-12-28 1989-07-07 Dainippon Printing Co Ltd 製版用ガラスパターン
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
US5178976A (en) * 1990-09-10 1993-01-12 General Electric Company Technique for preparing a photo-mask for imaging three-dimensional objects
GB2301050A (en) * 1995-05-12 1996-11-27 Kimoto Company Limited Antistatic masking film
GB2301050B (en) * 1995-05-12 1999-06-23 Kimoto Company Limited Masking films
JP2001056544A (ja) * 1999-08-18 2001-02-27 Dainippon Printing Co Ltd ハーフトーン位相シフトフォトマスク及びそのためのハーフトーン位相シフトフォトマスク用ブランクス並びにこれを用いたパターン形成方法
EP1132772A4 (en) * 1999-08-18 2003-11-19 Dainippon Printing Co Ltd HALFTONE PHASE SLIDER MASK, ROHLING FOR THIS, AND METHOD FOR PRODUCING A PATTERN

Also Published As

Publication number Publication date
JPS633302B2 (en]) 1988-01-22

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